Gaussian process regression for virtual metrology of plasma etch

IET Conference Publications

Volumn 2010, Issue 566 CP, 2010, Pages 42-47

  Lynn, S ^a   Ringwood, J ^a   MacGearailt, N ^b  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

Gaussian process regression; Plasma etch; virtual metrology

Indexed keywords

ETCH RATES; GAUSSIAN PROCESS REGRESSION; MODELLING TECHNIQUES; PLASMA ETCH; PROCESS VARIABLES; SEMICONDUCTOR MANUFACTURING PROCESS; VIRTUAL METROLOGY;

GAUSSIAN NOISE (ELECTRONIC); MATHEMATICAL MODELS; MEASUREMENTS; PLASMAS; REGRESSION ANALYSIS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

GAUSSIAN DISTRIBUTION;

EID: 78649602879     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1049/cp.2010.0485     Document Type: Conference Paper

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