Determination of SF6 reactive ion etching end point of the SiO2/Si system by plasma impedance monitoring

Microelectronic Engineering

Volumn 65, Issue 1-2, 2002, Pages 25-46

  Dewan, M N A ^a   McNally, P J ^a   Perova, T ^b   Herbert, P A F ^c  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c Plasma Ireland Ltd   (Ireland)

Author keywords

End point detection; In situ plasma monitoring; PIM; Plasma diagnostics; Plasma Impedance; Reactive ion etching

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC IMPEDANCE; ELECTRIC POTENTIAL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARMONIC ANALYSIS; PLASMA APPLICATIONS; POLYNOMIALS; SILICA;

END POINT DETECTION;

REACTIVE ION ETCHING;

EID: 0036892574     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00727-X     Document Type: Article

References (20)

1. Sternheim M., Van Gelder W., Hartman A. J. Electrochem. Soc.: Solid-State Sci. Technol. 130:1983;655.
2. Curtis B.J., Brunner H. J. Electrochem. Soc. 13:1978;829.
3. Harshbarger W., Miller T., Norton P., Porter R. Appl. Spectrosc. 31:1977;201.
4. Buyard G., Ruby B. Solid State Technol. 20:1977;53.
5. H. Busta, R.E. Lajos in: IEEE 1977 International Electron Devices Meeting (IEDM), 1977, p. 12.
6. Fortunato G. J. Phys. 20:1987;1051.
7. Tretola A. Electrochem. Soc. Proc. 81:1981;295.
8. Ukai K., Hanazawa K. J. Vac. Sci. Technol. 16:1979;385.
9. Patel V., Singh B., Thomas J.H. III. Appl. Phys. Lett. 61:1992;1912.
10. M.N.A. Dewan, P.J. McNally, P.A.F. Herbert, in: Proc. 14th European Conf. on the Atomic and Molecular Physics of Ionized Gases (ESCAMPIG 98), 1998, 22H, p. 378.
11. M.N.A. Dewan, P.J. McNally, P.A.F. Herbert, in: Proc. Int. Conf. on Advances in Materials & Processing Technologies (AMPT '99), 1999, II, p. 939.
12. Internet: http://www.scisys.com (Dublin, Ireland: Scientific Systems Ltd., 2000).
13. Box G.E.P., Behnken D.W. Technometrics. 2:1960;455.
14. Schmidt S.R., Launsby R.G. Understanding Industrial Designed Experiments. 1997;Air Academy Press, Colorado.
15. Scientific Systems Ltd, Smart PIM™ installation and software manual. 1997;Scientific Systems Ltd, Dublin, Ireland.
16. Wong J. J. Appl. Phys. 44:1973;5629.
17. Boyd I.W., Wilson J.I.B. J. Appl. Phys. 53:1982;4166.
18. Nuquist R.A., Kagel R.O. Handbook of Infrared and Raman Spectra of Inorganic Compounds and Organic Salts. (a 4-Volume set):1997;Academic Press Inc, NewYork.
19. Lucovsky G., Manitini M.J., Srivastava J.K., Irene E.A. J. Vac. Sci. Technol. B. 5:1987;530.
20. Bishop M. The Quality Edge: User's Guide. 1991;Schmidt/Launsby, Consulting, Colorado.