Influence of sputtering power on properties of ZnO thin films fabricated by RF sputtering in room temperature

Science China Information Sciences

Volumn 55, Issue 4, 2012, Pages 951-955

  Han, DeDong ^a   Wang, Yi ^a   Zhang, ShengDong ^a   Sun, Lei ^a   Han, RuQi ^a   Matsumoto, Satoru ^b   Ino, Yuji ^b  

^a PEKING UNIVERSITY   (China)

^b KEIO UNIVERSITY   (Japan)

Author keywords

room temperature process; sputtering power; transparent oxide semiconductor; ZnO thin film

Indexed keywords

EID: 84858285524     PISSN: 1674733X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11432-011-4347-z     Document Type: Article

References (20)

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