Effects of Li doping on the performance and environmental stability of solution processed ZnO thin film transistors

Applied Physics Letters

Volumn 95, Issue 19, 2009, Pages

  Nayak, Pradipta K ^a   Jang, Jongsu ^a   Lee, Changhee ^a   Hong, Yongtaek ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DOPED ZNO; ENVIRONMENTAL STABILITY; FIELD-EFFECT MOBILITIES; SOLUTION-PROCESSED; ZNO; ZNO FILMS; ZNO THIN FILM;

DOPING (ADDITIVES); LITHIUM; METALLIC FILMS; SEMICONDUCTING ZINC COMPOUNDS; THIN FILM TRANSISTORS; THIN FILMS; ZINC;

ZINC OXIDE;

EID: 70449706274     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3262956     Document Type: Article

References (17)

1. P. F. Carcia, R. S. McLean, M. H. Reilly, and G. Nunes, Appl. Phys. Lett. 0003-6951 82, 1117 (2003). 10.1063/1.1553997
2. S. Masuda, K. Kitamura, Y. Okumura, S. Miyatake, H. Tabata, and T. Kawai, J. Appl. Phys. 0021-8979 93, 1624 (2003). 10.1063/1.1534627
3. E. M. C. Fortunato, P. M. C. Barquinha, A. C. M. G. Pimentel, A. M. F. Goncalves, A. J. S. Marques, L. M. N. Pereira, and R. F. P. Martins, Adv. Mater. 0935-9648 17, 590 (2005). 10.1002/adma.200400368 (Pubitemid 40448713)
4. R. L. Hoffman, B. J. Norris, and J. F. Wager, Appl. Phys. Lett. 0003-6951 82, 733 (2003). 10.1063/1.1542677
5. W. B. Jackson, R. L. Hoffman, and G. S. Herman, Appl. Phys. Lett. 0003-6951 87, 193503 (2005). 10.1063/1.2120895
6. B. S. Ong, C. Li, Y. Li, Y. Wu, and R. Loutfy, J. Am. Chem. Soc. 0002-7863 129, 2750 (2007). 10.1021/ja068876e (Pubitemid 46417940)
7. D. Redinger and V. Subramanian, IEEE Trans. Electron Devices 0018-9383 54, 1301 (2007). 10.1109/TED.2007.895861 (Pubitemid 46864764)
8. J. Liu, W. Weng, W. Ding, K. Cheng, P. Du, G. Shen, and G. Han, Surf. Coat. Technol. 0257-8972 198, 274 (2005). 10.1016/j.surfcoat.2004.10.081 (Pubitemid 40864543)
9. S. Fujihara, C. Sasaki, and T. Kimura, J. Eur. Ceram. Soc. 0955-2219 21, 2109 (2001). 10.1016/S0955-2219(01)00182-0 (Pubitemid 32764002)
10. M. Joseph, H. Tabata, and T. Kawai, Appl. Phys. Lett. 0003-6951 74, 2534 (1999). 10.1063/1.123889
11. Dhananjay, S. Singh, J. Nagaraju, and S. B. Krupanidhi, Appl. Phys. A: Mater. Sci. Process. 0947-8396 88, 421 (2007). 10.1007/s00339-007-4002-0 (Pubitemid 46934709)
12. C. Li, Y. Li, Y. Wu, B. S. Ong, and R. Loutfy, J. Mater. Chem. 0959-9428 19, 1626 (2009). 10.1039/b812047a
13. ITO/ATO substrates supplied by Beneq Oy, Finland, olli.jylha@beneq.com.
14. A. L. Dent and R. J. Kokes, J. Phys. Chem. 0022-3654 73, 3772 (1969). 10.1021/j100845a035
15. E. Traversa and A. Bearzotti, Sensors and Actuators B 0925-4005 23, 181 (1995). 10.1016/0925-4005(94)01271-I
16. M. S. Oh, D. K. Hwang, J. H. Lim, Y. S. Choi, and S. -J. Park, Appl. Phys. Lett. 0003-6951 91, 212102 (2007). 10.1063/1.2816119 (Pubitemid 350159040)
17. M. C. Chen, T. C. Chang, S. Y. Huang, K. C. Chang, H. W. Li, S. C. Chen, J. Lu, and Y. Shi, Appl. Phys. Lett. 0003-6951 94, 162111 (2009). 10.1063/1.3124658