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Current Applied Physics

Volumn 12, Issue 3, 2012, Pages 849-853

Structural and nanomechanical properties of a-plane ZnO thin films deposited under different oxygen partial pressures

(5) Jian, Sheng Rui a Chen, Hou Guang a Chen, Guo Ju a Jang, Jason S C b Juang, Jenh Yih c

a I SHOU UNIVERSITY (Taiwan)

b NATIONAL CENTRAL UNIVERSITY (Taiwan)

c NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

a Plane ZnO thin film; Cross sectional transmission electron microscopy; Focused ion beam; Nanoindentation

Indexed keywords

A-PLANE; AVERAGE VALUES; BERKOVICH INDENTERS; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; CROSS-SECTIONAL TEM; EPITAXIAL RELATIONSHIPS; FILM DEFORMATIONS; FILM-SUBSTRATE INTERFACES; LOCALIZED PLASTIC DEFORMATION; NANOINDENTATION TECHNIQUES; NANOMECHANICAL PROPERTY; OXYGEN PARTIAL PRESSURE; PRESSURE-INDUCED PHASE TRANSFORMATIONS; RF-MAGNETRON SPUTTERING; SAPPHIRE SUBSTRATES; SELECTED AREA DIFFRACTION; SLIP BAND; THREADING DISLOCATION; XRD; YOUNG'S MODULUS; ZNO; ZNO FILMS; ZNO THIN FILM;

FOCUSED ION BEAMS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; NANOINDENTATION; OPTICAL FILMS; PARTIAL PRESSURE; SAPPHIRE; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

METALLIC FILMS;

EID: 84857447007 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2011.11.018 Document Type: Article

Times cited : (23)

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