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Volumn 45, Issue 2, 2012, Pages

Influence of the oxygen partial pressure and post-deposition annealing on the structure and optical properties of ZnO films grown by dc magnetron sputtering at room temperature

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP ENERGY; CHEMICAL COMPOSITIONS; CRYSTAL PLANES; CRYSTAL QUALITIES; CRYSTALLINE STRUCTURE; CRYSTALLINITIES; DC MAGNETRON SPUTTERING; DEGREE OF CRYSTALLINITY; DEPOSITION PROCESS; GROWTH CONDITIONS; OPTICAL PERFORMANCE; OPTICAL RESPONSE; OXYGEN GAS FLOW; OXYGEN PARTIAL PRESSURE; POST DEPOSITION ANNEALING; ROOM TEMPERATURE; SYSTEMATIC STUDY; X-RAY ABSORPTION NEAR-EDGE STRUCTURE; XANES; ZNO; ZNO FILMS; ZNO THIN FILM;

EID: 84255193246     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/2/025303     Document Type: Article
Times cited : (48)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.