Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering

Materials Science in Semiconductor Processing

Volumn 10, Issue 4-5, 2007, Pages 167-172

  Ma, Quan Bao ^a   Ye, Zhi Zhen ^a   He, Hai Ping ^a   Zhu, Li Ping ^a   Zhao, Bing Hui ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Electrical and optical properties; Magnetron sputtering; Transparent conductive oxide films; ZnO:Ga

Indexed keywords

GALLIUM; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; X RAY DIFFRACTION; ZINC OXIDE;

DEPOSITION PRESSURE; TRANSPARENT CONDUCTIVE OXIDE FILMS;

THIN FILMS;

EID: 40849147309     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2007.11.001     Document Type: Article

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