Single digit nanofabrication by step-and-repeat nanoimprint lithography

Nanotechnology

Volumn 23, Issue 1, 2012, Pages

  Peroz, C ^a,b   Dhuey, S ^b   Cornet, M ^b   Vogler, M ^c   Olynick, D ^b   Cabrini, S ^b  

^a Beam Technologies   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH FIDELITY; NANO-FABRICATION METHODS; NANO-IMPRINT; NOVEL STRATEGIES; SIZE DEPENDENT; STEP-AND-REPEAT;

ATOMIC LAYER DEPOSITION; ELECTRON BEAMS; FUNCTIONAL MATERIALS; NANOTECHNOLOGY;

NANOIMPRINT LITHOGRAPHY;

EID: 83455225127     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/1/015305     Document Type: Article

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