Sub- 15 nm nanoimprint molds and pattern transfer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2837-2840

  Morecroft, Debbie ^a   Yang, Joel K W ^a   Schuster, S ^a   Berggren, Karl K ^a   Xia, Qiangfei ^b   Wu, Wei ^b   Williams, R Stanley ^b  

^a USA   (United States)

^b HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN SILSESQUIOXANE; NANO-IMPRINT; NANOIMPRINT MOLDS; PATTERN TRANSFERS; PROCESS FLOWS; PROCESSING ROUTE; SILICON SUBSTRATES;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; FUNCTIONAL MATERIALS; MOLDS; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 72849107842     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3264670     Document Type: Conference Paper

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