-
1
-
-
78649340782
-
-
10.1109/JPROC.2010.2070830
-
H. Akinaga and H. Shima, Proc. IEEE 98, 2237 (2010). 10.1109/JPROC.2010. 2070830
-
(2010)
Proc. IEEE
, vol.98
, pp. 2237
-
-
Akinaga, H.1
Shima, H.2
-
3
-
-
79956084549
-
-
10.1088/0957-4484/22/25/254010
-
K. M. Kim, B. J. Choi, M. H. Lee, G. H. Kim, S. J. Song, J. Y. Seok, J. H. Yoon, S. Han, and C. S. Hwang, Nanotechnology 22, 254010 (2011). 10.1088/0957-4484/22/25/254010
-
(2011)
Nanotechnology
, vol.22
, pp. 254010
-
-
Kim, K.M.1
Choi, B.J.2
Lee, M.H.3
Kim, G.H.4
Song, S.J.5
Seok, J.Y.6
Yoon, J.H.7
Han, S.8
Hwang, C.S.9
-
4
-
-
67650102619
-
-
10.1002/adma.200900375
-
R. Waser, R. Dittmann, G. Staikov, and K. Szot, Adv. Mater. 21, 2632 (2009). 10.1002/adma.200900375
-
(2009)
Adv. Mater.
, vol.21
, pp. 2632
-
-
Waser, R.1
Dittmann, R.2
Staikov, G.3
Szot, K.4
-
5
-
-
51949093158
-
-
N. Xu, B. Gao, L. F. Liu, B. Sun, X. Y. Liu, R. Q. Han, J. F. Kang, and B. Yu, Dig. Tech. Pap.-Symp. VLSI Technol. 2008, 100.
-
Dig. Tech. Pap. - Symp. VLSI Technol.
, vol.2008
, pp. 100
-
-
Xu, N.1
Gao, B.2
Liu, L.F.3
Sun, B.4
Liu, X.Y.5
Han, R.Q.6
Kang, J.F.7
Yu, B.8
-
6
-
-
59849099356
-
-
10.1109/TED.2008.2010583
-
U. Russo, D. Ielmini, C. Cagli, and A. L. Lacaita, IEEE Trans. Electron Devices 56, 186 (2009). 10.1109/TED.2008.2010583
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, pp. 186
-
-
Russo, U.1
Ielmini, D.2
Cagli, C.3
Lacaita, A.L.4
-
9
-
-
58149239895
-
-
10.1103/PhysRevB.78.235418
-
N. Das, S. Tsui, Y. Y. Xue, Y. Q. Wang, and C. W. Chu, Phys. Rev. B 78, 235418 (2008). 10.1103/PhysRevB.78.235418
-
(2008)
Phys. Rev. B
, vol.78
, pp. 235418
-
-
Das, N.1
Tsui, S.2
Xue, Y.Y.3
Wang, Y.Q.4
Chu, C.W.5
-
10
-
-
33751557951
-
Impedance spectroscopy characterization of resistance switching NiO thin films prepared through atomic layer deposition
-
DOI 10.1063/1.2392991
-
Y.-H. You, B.-S. So, J.-H. Hwang, W. Cho, S. S. Lee, T.-M. Chung, C. G. Kim, and K.-S. An, Appl. Phys. Lett. 89, 222105 (2006). 10.1063/1.2392991 (Pubitemid 44847553)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.22
, pp. 222105
-
-
You, Y.-H.1
So, B.-S.2
Hwang, J.-H.3
Cho, W.4
Lee, S.S.5
Chung, T.-M.6
Kim, C.G.7
An, K.-S.8
-
11
-
-
33747862197
-
2 thin films showing resistive switching
-
DOI 10.1063/1.2336621
-
D. S. Jeong, H. Schroeder, and R. Waser, Appl. Phys. Lett. 89, 082909 (2006). 10.1063/1.2336621 (Pubitemid 44286167)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.8
, pp. 082909
-
-
Jeong, D.S.1
Schroeder, H.2
Waser, R.3
-
12
-
-
77951572497
-
-
10.1063/1.3400222
-
M. H. Lee, K. M. Kim, G. H. Kim, J. Y. Seok, S. J. Song, J. H. Yoon, and C. S. Hwang, Appl. Phys. Lett. 96, 152909 (2010). 10.1063/1.3400222
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 152909
-
-
Lee, M.H.1
Kim, K.M.2
Kim, G.H.3
Seok, J.Y.4
Song, S.J.5
Yoon, J.H.6
Hwang, C.S.7
-
13
-
-
79955715103
-
-
H. Y. Lee, Y. S. Chen, P. S. Chen, P. Y. Gu, Y. Y. Hsu, S. M. Wang, W. H. Liu, C. H. Tsai, S. S. Sheu, P. C. Chiang, Tech. Dig.-Int. Electron Devices Meet. 2010, 460.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2010
, pp. 460
-
-
Lee, H.Y.1
Chen, Y.S.2
Chen, P.S.3
Gu, P.Y.4
Hsu, Y.Y.5
Wang, S.M.6
Liu, W.H.7
Tsai, C.H.8
Sheu, S.S.9
Chiang, P.C.10
-
14
-
-
79955726402
-
-
S.-S. Sheu, M.-F. Chang, K.-F. Lin, C.-W. Wu, Y.-S. Chen, P.-F. Chiu, C.-C. Kuo, Y.-S. Yang, P.-C. Chiang, W.-P. Lin, Dig. Tech. Pap.-IEEE Int. Solid-State Circuits Conf. 2011, 200.
-
Dig. Tech. Pap.-IEEE Int. Solid-State Circuits Conf.
, vol.2011
, pp. 200
-
-
Sheu, S.-S.1
Chang, M.-F.2
Lin, K.-F.3
Wu, C.-W.4
Chen, Y.-S.5
Chiu, P.-F.6
Kuo, C.-C.7
Yang, Y.-S.8
Chiang, P.-C.9
Lin, W.-P.10
-
15
-
-
74249119926
-
-
10.1149/1.3267050
-
S. Yu, B. Gao, H. B. Dai, B. Sun, L. F. Liu, X. Y. Liu, R. Q. Han, J. F. Kang, and B. Yu, Electrochem. Solid-State Lett. 13, H36 (2010). 10.1149/1.3267050
-
(2010)
Electrochem. Solid-State Lett.
, vol.13
, pp. 36
-
-
Yu, S.1
Gao, B.2
Dai, H.B.3
Sun, B.4
Liu, L.F.5
Liu, X.Y.6
Han, R.Q.7
Kang, J.F.8
Yu, B.9
-
16
-
-
79960834019
-
-
10.1109/TED.2011.2147791
-
S. Yu, Y. Wu, R. Jeyasingh, D. Kuzum, and H.-S. P. Wong, IEEE Trans. Electron Devices 58, 2729 (2011). 10.1109/TED.2011.2147791
-
(2011)
IEEE Trans. Electron Devices
, vol.58
, pp. 2729
-
-
Yu, S.1
Wu, Y.2
Jeyasingh, R.3
Kuzum, D.4
Wong, H.-S.P.5
-
19
-
-
0015035118
-
-
10.1080/14786437108216402
-
M. Pollak, Philos. Mag. 23 (183), 519 (1971). 10.1080/14786437108216402
-
(1971)
Philos. Mag.
, vol.23
, Issue.183
, pp. 519
-
-
Pollak, M.1
-
20
-
-
0023308715
-
-
10.1080/00018738700101971
-
S. R. Elliott, Adv. Phys. 36 (2), 135 (1987). 10.1080/00018738700101971
-
(1987)
Adv. Phys.
, vol.36
, Issue.2
, pp. 135
-
-
Elliott, S.R.1
-
22
-
-
79951951303
-
-
10.1109/LED.2010.2099205
-
X. A. Tran, H. Y. Yu, Y. C. Yeo, L. Wu, W. J. Liu, Z. R. Wang, Z. Fang, K. L. Pey, X. W. Sun, A. Y. Du, IEEE Electron Device Lett. 32, 396 (2011). 10.1109/LED.2010.2099205
-
(2011)
IEEE Electron Device Lett.
, vol.32
, pp. 396
-
-
Tran, X.A.1
Yu, H.Y.2
Yeo, Y.C.3
Wu, L.4
Liu, W.J.5
Wang, Z.R.6
Fang, Z.7
Pey, K.L.8
Sun, X.W.9
Du, A.Y.10
-
24
-
-
77951587543
-
-
10.1063/1.3357283
-
P. Gonon, M. Mougenot, C. Vallée, C. Jorel, V. Jousseaume, H. Grampeix, and F. El Kamel, J. Appl. Phys. 107, 074507 (2010). 10.1063/1.3357283
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 074507
-
-
Gonon, P.1
Mougenot, M.2
Vallée, C.3
Jorel, C.4
Jousseaume, V.5
Grampeix, H.6
El Kamel, F.7
-
26
-
-
29144521437
-
Tunneling-assisted Poole-Frenkel conduction mechanism in Hf O2 thin films
-
DOI 10.1063/1.2135895, 113701
-
D. S. Jeong and C. S. Hwang, J. Appl. Phys. 98, 113701 (2005). 10.1063/1.2135895 (Pubitemid 41816233)
-
(2005)
Journal of Applied Physics
, vol.98
, Issue.11
, pp. 1-8
-
-
Jeong, D.S.1
Hwang, C.S.2
|