General rule for predicting surface segregation of substrate metal on film surface

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1432-1437

  Yoshitake, Michiko ^a   Aparna, Yarrama Reddy ^a   Yoshihara, Kazuhiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AUGER ELECTRON SPECTROSCOPY; GRAIN BOUNDARIES; HEATING; INTERFACIAL ENERGY; INTERMETALLICS; MAGNETRON SPUTTERING; PHASE DIAGRAMS; SEGREGATION (METALLOGRAPHY); SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM DEPOSITION;

METALLIC FILMS;

EID: 0035393228     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1376699     Document Type: Article

References (21)