Optimized scratch adhesion for TiSiN coatings deposited by a combination of DC and RF sputtering

Surface and Coatings Technology

Volumn 206, Issue 7, 2011, Pages 1837-1844

  Bushroa, A R ^a   Masjuki, H H ^a   Muhamad, M R ^a   Beake, B D ^b  

^a UNIVERSITY OF MALAYA   (Malaysia)

^b MICRO MATERIALS LTD   (United Kingdom)

Author keywords

Magnetron sputtering; Optimization; Scratch test; Taguchi method; TiSiN

Indexed keywords

CRITICAL LOAD; DC POWER; DEPOSITION TIME; DIRECT CURRENT; EXPERIMENTAL STUDIES; GAS RATIO; HIGH SPEED STEEL SUBSTRATE; MICRO-SCRATCH TEST; OPTICAL MICROSCOPES; ORTHOGONAL ARRAY; PROCESS PARAMETERS; PVD MAGNETRON; RADIO FREQUENCIES; RF-POWER; RF-SPUTTERING; SCRATCH TEST; TAGUCHI; TISIN;

ADHESION; ARGON; COATINGS; MAGNETRON SPUTTERING; NITROGEN; OPTIMIZATION; SURFACE STRUCTURE; TAGUCHI METHODS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DC POWER TRANSMISSION;

EID: 82755197850     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.07.048     Document Type: Article

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