X-ray diffraction on nanocrystalline Ti1-xAlxN thin films

Journal of Alloys and Compounds

Volumn 378, Issue 1-2, 2004, Pages 107-111

  Rafaja, D ^a   Sima M ^b   Klemm, V ^a   Schreiber, G ^a   Heger, D ^a   Havela, L ^c   Kuzel R ^c  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b SHM Ltd   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Nanostructures; TEM; Thin films; Vapour deposition; X ray diffraction

Indexed keywords

COMPRESSIVE STRESS; EVAPORATION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PROTECTIVE COATINGS; RESIDUAL STRESSES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ARC EVAPORATION; LATTICE DEFORMATION; MICROSTRAIN;

TITANIUM ALLOYS;

EID: 4344569791     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2003.10.087     Document Type: Conference Paper

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