SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 307, Issue 1-2, 1997, Pages 156-162

An energy approach to quantification of adhesion strength from critical loads in scratch tests

(2) Park, H S a Kwon, D a

a Seoul National University (South Korea)

Author keywords

Critical load; Elastic deformation energy; Scratch test; Work of adhesion

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; COBALT; FRICTION; INTERFACIAL ENERGY; PLASMA APPLICATIONS; PLASTIC DEFORMATION; SPALLING; STRAIN; STRENGTH OF MATERIALS; STRESS ANALYSIS; TUNGSTEN CARBIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SCRATCH TESTS; STRAIN MATCHING;

DIAMOND FILMS;

EID: 0031251110 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00147-8 Document Type: Article

Times cited : (36)

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