-
4
-
-
0032154661
-
-
10.1143/JJAP.37.L1068
-
Li Yang Albert, R. W. Bower, and I. Bencuya, Japanese Journal of Applied Physics, 37, 1068 (1998). 10.1143/JJAP.37.L1068
-
(1998)
Japanese Journal of Applied Physics
, vol.37
, pp. 1068
-
-
Yang Albert, L.1
Bower, R.W.2
Bencuya, I.3
-
5
-
-
0032594183
-
-
10.1149/1.1390894
-
A Fan, A. Rahman, and R Reif, Electrochemical and Solid-State Letters, 2, 534 (1999). 10.1149/1.1390894
-
(1999)
Electrochemical and Solid-State Letters
, vol.2
, pp. 534
-
-
Fan, A.1
Rahman, A.2
Reif, R.3
-
6
-
-
0035304419
-
-
10.1007/s11664-001-0039-6
-
Kuan-Neng Chen, Andy Fan, and Rafael Reif, Journal of Electronic Materials, 30, 331 (2001). 10.1007/s11664-001-0039-6
-
(2001)
Journal of Electronic Materials
, vol.30
, pp. 331
-
-
Chen, K.-N.1
Fan, A.2
Reif, R.3
-
7
-
-
0037065038
-
Microstructure evolution and abnormal grain growth during copper wafer bonding
-
DOI 10.1063/1.1521240
-
K. N. Chen, A. Fan, C. S. Tan, R. Reif, and C. Y. Wen, Applied Physics Letters, 81, 3774 (2002). 10.1063/1.1521240 (Pubitemid 35445509)
-
(2002)
Applied Physics Letters
, vol.81
, Issue.20
, pp. 3774-3776
-
-
Chen, K.N.1
Fan, A.2
Tan, C.S.3
Reif, R.4
Wen, Y.5
-
8
-
-
0037350078
-
-
10.1116/1.1537716
-
T. H. Kim, M. M. R. Howlader, T. Itoh, and T. Suga, Journal of Vacuum Science Technology A, 21, 449 (2003). 10.1116/1.1537716
-
(2003)
Journal of Vacuum Science Technology A
, vol.21
, pp. 449
-
-
Kim, T.H.1
Howlader, M.M.R.2
Itoh, T.3
Suga, T.4
-
9
-
-
70449723223
-
-
10.1063/1.3263154
-
C. S. Tan, D. F. Lim, S. G. Singh, S. K. Goulet, and M. Bergkvist, Applied Physics Letters, 95, 192108 (2009). 10.1063/1.3263154
-
(2009)
Applied Physics Letters
, vol.95
, pp. 192108
-
-
Tan, C.S.1
Lim, D.F.2
Singh, S.G.3
Goulet, S.K.4
Bergkvist, M.5
-
10
-
-
0037103962
-
Interfacial morphologies and possible mechanisms of copper wafer bonding
-
DOI 10.1023/A:1016554821201
-
K. N. Chen, A Fan, and R. Reif, Journal of Materials Science, 7, 3441 (2002). 10.1023/A:1016554821201 (Pubitemid 34979763)
-
(2002)
Journal of Materials Science
, vol.37
, Issue.16
, pp. 3441-3446
-
-
Chen, K.N.1
Fan, A.2
Reif, R.3
-
11
-
-
77958493117
-
-
10.1149/1.3487926
-
D. F. Lim, X. F. Ang, J. Wei, C. M. Ng, and C. S. Tan, Electrochemical and Solid-State Letters, 13, H412 (2010). 10.1149/1.3487926
-
(2010)
Electrochemical and Solid-State Letters
, vol.13
, pp. 412
-
-
Lim, D.F.1
Ang, X.F.2
Wei, J.3
Ng, C.M.4
Tan, C.S.5
-
12
-
-
33750437717
-
Low-temperature bonding of copper pillars for all-copper chip-to-substrate interconnections
-
DOI 10.1149/1.2353905
-
A. He, T. Osborn, S. A. Bidstrup Allen, and P. A. Kohl, Electrochemical and Solid-State Letters 9, C192 (2006). 10.1149/1.2353905 (Pubitemid 44652651)
-
(2006)
Electrochemical and Solid-State Letters
, vol.9
, Issue.12
, pp. 192-195
-
-
He, A.1
Osborn, T.2
Bidstrup Allen, S.A.3
Kohl, P.A.4
-
13
-
-
40549097113
-
All-copper chip-to-substrate interconnects Part I. Fabrication and characterization
-
DOI 10.1149/1.2839007
-
T. Osborn, A. He, N. Galiba, and P. A. Kohl, Journal of the Electrochemical Society, 155, D308 (2008). 10.1149/1.2839007 (Pubitemid 351357504)
-
(2008)
Journal of the Electrochemical Society
, vol.155
, Issue.4
-
-
Osborn, T.1
He, A.2
Galiba, N.3
Kohl, P.A.4
-
14
-
-
40549127202
-
All-copper chip-to-substrate interconnects Part II. Modeling and design
-
DOI 10.1149/1.2839014
-
A. He, T. Osborn, S. A. Bidstrup Allen, and P. A. Kohl, Journal of the Electrochemical Society, 155, D314 (2008). 10.1149/1.2839014 (Pubitemid 351357505)
-
(2008)
Journal of the Electrochemical Society
, vol.155
, Issue.4
-
-
He, A.1
Osborn, T.2
Bidstrup Allen, S.A.3
Kohl, P.A.4
-
15
-
-
59049088974
-
-
10.1016/j.mee.2008.11.080
-
T. Osborn, C. Hunter Lightsey, and P. A. Kohl, Microelectronic Engineering, 86, 379-386 (2009). 10.1016/j.mee.2008.11.080
-
(2009)
Microelectronic Engineering
, vol.86
, pp. 379-386
-
-
Osborn, T.1
Hunter Lightsey, C.2
Kohl, P.A.3
-
16
-
-
65949094581
-
-
10.1149/1.3123288
-
T. Osborn, N. Galiba, and P. A. Kohl, Journal of the Electrochemical Society, 156, D226 (2009). 10.1149/1.3123288
-
(2009)
Journal of the Electrochemical Society
, vol.156
, pp. 226
-
-
Osborn, T.1
Galiba, N.2
Kohl, P.A.3
-
18
-
-
31044437398
-
Process integration for through-silicon vias
-
DOI 10.1116/1.1864012
-
S. Spiesshoefer, Z. Rahman, G. Vangara, S. Polamreddy, S. Burkett, and L. Schaper, Journal of Vacuum Science and Technology A, 23 (4), 824 (2005). 10.1116/1.1864012 (Pubitemid 43119211)
-
(2005)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.23
, Issue.4
, pp. 824-829
-
-
Spiesshoefer, S.1
Rahman, Z.2
Vangara, G.3
Polamreddy, S.4
Burkett, S.5
Schaper, L.6
-
20
-
-
0030703837
-
-
10.1016/S0013-4686(97)00146-1
-
L. T. Romankiw, Electrochimica Acta, 42, 2985 (1997). 10.1016/S0013-4686(97)00146-1
-
(1997)
Electrochimica Acta
, vol.42
, pp. 2985
-
-
Romankiw, L.T.1
-
21
-
-
22544459658
-
Influence of convection-dependent adsorption of additives on microvia filling by copper electroplating
-
DOI 10.1149/1.1901670
-
W.-P. Dow, H.-S. Huang, M.-Y. Yen, H.-C. Huang, Journal of the Electrochemical Society., 152 (6), C425 (2005). 10.1149/1.1901670 (Pubitemid 41013488)
-
(2005)
Journal of the Electrochemical Society
, vol.152
, Issue.6
-
-
Dow, W.-P.1
Huang, H.-S.2
Yen, M.-Y.3
Huang, H.-C.4
-
22
-
-
77949730310
-
-
10.1149/1.3313111
-
T. Haba, H. Suzuki, H. Yoshida, H. Akahoshi, and A. Chinda, Electrochemical and Solid States Letters, 13 (5), D23 (2010). 10.1149/1.3313111
-
(2010)
Electrochemical and Solid States Letters
, vol.13
, Issue.5
, pp. 23
-
-
Haba, T.1
Suzuki, H.2
Yoshida, H.3
Akahoshi, H.4
Chinda, A.5
-
23
-
-
0001324954
-
A Simple Equation for Predicting Superconformal Electrodeposition in Submicrometer Trenches
-
DOI 10.1149/1.1414287
-
D. Josell, D. Wheeler, W. H. Huber, J. E. Bonevich, and T. P. Moffat, Journal of the Electrochemical Society, 148 (12), C767 (2001). 10.1149/1.1414287 (Pubitemid 33696314)
-
(2001)
Journal of the Electrochemical Society
, vol.148
, Issue.12
-
-
Josell, D.1
Wheeler, D.2
Huber, W.H.3
Bonevich, J.E.4
Moffat, T.P.5
|