Defect reduction of high-density full-field patterns in jet and flash imprint lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 3, 2011, Pages

  Singh, Lovejeet ^a   Luo, Kang ^a   Ye, Zhengmao ^a   Xu, Frank ^a   Haase, Gaddi ^a   Curran, David ^a   LaBrake, Dwayne ^a   Resnick, Douglas ^a   Sreenivasan, S V ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

Defectivity; Imprint lithography; Imprint masks; J FIL; Jet and flash imprint lithography; Nonfill defects; Repeater defects; Templates

Indexed keywords

DEFECT DENSITY; FLASH MEMORY; NANOIMPRINT LITHOGRAPHY;

DEFECTIVITY; IMPRINT LITHOGRAPHY; IMPRINT MASKS; J-FIL; NONFILL DEFECTS; REPEATER DEFECTS; TEMPLATES;

DEFECTS;

EID: 80055064520     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3625635     Document Type: Article

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