Advanced mask metrology enabling characterization of imprint lithography templates

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 384-391

  Myron, L Jeff ^a   Gershtein, Liraz ^b   Gottlieb, Gidi ^b   Burkhardt, Bob ^b   Griffiths, Andrew ^b   Mellenthin, David ^c   Rentzsch, Kevin ^c   MacDonald, Susan ^c   Hughes, Greg ^c  

^a MOLECULAR IMPRINTS INC   (United States)

^b Applied Materials Inc Israel   (Israel)

^c DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALLY AMPLIFIED RESISTS (CAR); CRITICAL DIMENSION (CD); IMPRINT LITHOGRAPHY; MASK METROLOGY;

DIMENSIONAL STABILITY; INTEGRATED CIRCUITS; LIGHTING; MEASUREMENT THEORY; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR MATERIALS;

MASKS;

EID: 24644512206     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.603718     Document Type: Conference Paper

References (8)

1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, "Nanoimprint lithography," J. Vac. Sci., Tech. B, 1996. 14(6): p. 4129.
2. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S.V. Sreenivasan, C. Grant Willson, "Step and Flash Imprint Lithography," Solid State Technology, July 2001.
3. D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, E. Ainley, K. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi, S. Johnson, S. V. Sreenivasan, J. G. Ekerdt, C. G. Willson, "High resolution templates for step and flash imprint lithography", Proc. of SPIE, vol. 4688, pp. 205-213, 2002.
4. S. V. Sreenivasan, C. G. Willson, N. E. Schumaker, and D. J. Resnick, "Cost analysis of step and flash imprint lithography", Proc. of SPIE, vol. 4688, pp. 903-909, 2002.
5. M. Colburn, A. Grot, M. Amistoso, B. J. Choi, T. Bailey, J. Ekerdt, S.V. Sreenivasan, J. Hollenhorst, C. G. Willson; "Step and flash imprint lithography for sub-100nm patterning", Proc. of SPIE, vol. 3997, pp. 453-457, (2000).
6. B. J. Choi, S. Johnson, M. Colburn, S.V. Sreenivasan, C. G. Willson; "Design of orientation stages for step and flash imprint lithography", J. Precision Engineering, vol. 25, no. 3, July 2001.
7. M. Colburn, S. Johnson, M. Stewart, S. Damle, B. J. Choi, T. Bailey, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J. Ekerdt, C.G. Willson; "Step and flash imprint lithography: An alternative approach to high Resolution patterning.", Proc. of SPIE, vol. 3676, pp. 379-389 (1999).
8. D. Resnick, private communication.