Pattern transfer to silicon by microcontact printing and RIE

Nanotechnology

Volumn 7, Issue 4, 1996, Pages 447-451

  Whidden, Thomas K ^a   Ferry, David K ^a   Kozicki, Michael N ^a   Kim, Enoch ^b   Kumar, Amit ^b   Wilbur, James ^b   Whitesides, George M ^b  

^a ARIZONA STATE UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTRON MICROSCOPY; MONOLAYERS; MORPHOLOGY; NANOTECHNOLOGY; PRINTING; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

ALKANETHIOLS; EDGE DEFINITION; MICROCONTACT PRINTING; PATTERN TRANSFER; SELF ASSEMBLED MONOLAYERS;

MASKS;

EID: 0030359056     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/7/4/027     Document Type: Article

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