Monte Carlo modeling in the low-energy domain of the secondary electron emission of polymethylmethacrylate for critical-dimension scanning electron microscopy

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 9, Issue 2, 2010, Pages

  Dapor, Maurizio ^a,b   Ciappa, Mauro ^c   Fichtner, Wolfgang ^c  

^a ITC IRST   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

^c ETH ZURICH   (Switzerland)

Author keywords

Dielectric materials; Monte Carlo simulation; PMMA; Secondary electrons

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; ELECTRONS; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION;

CRITICAL DIMENSION; ENERGY DOMAIN; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; LOW ENERGIES; MONTE CARLO MODEL; MONTE CARLO MODELING; MONTE CARLO SIMULATION; PMMA; PRIMARY ELECTRON BEAMS; SCATTERING MECHANISMS; SECONDARY ELECTRON EMISSIONS; SECONDARY ELECTRONS;

DIELECTRIC MATERIALS;

EID: 77950674134     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3373517     Document Type: Article

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