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Volumn 258, Issue 1, 2011, Pages 2-6
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Wafer-level fabrication and optical characterization of nanoscale patterned sapphire substrates
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Author keywords
Antireflection; Natural lithography; Patterned sapphire
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Indexed keywords
FABRICATION;
INDUCTIVELY COUPLED PLASMA;
LITHOGRAPHY;
NANOSTRUCTURES;
NICKEL COMPOUNDS;
OPTICAL PROPERTIES;
REFLECTION;
SAPPHIRE;
SILICIDES;
ANTI-REFLECTION;
ANTIREFLECTIVE CHARACTERISTICS;
INDUCTIVELY COUPLED PLASMA DRY ETCHING;
NATURAL LITHOGRAPHY;
OPTICAL CHARACTERIZATION;
PATTERNED SAPPHIRE;
PATTERNED SAPPHIRE SUBSTRATE;
POLARIZATION PROPERTIES;
SUBSTRATES;
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EID: 80054771088
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2011.07.117 Document Type: Article |
Times cited : (28)
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References (28)
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