Inductively coupled plasma etching of nano-patterned sapphire for flip-chip GaN light emitting diode applications

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7744-7747

  Kim, Byung Jae ^a   Mastro, Michael A ^b   Jung, Hyunjung ^a   Kim, Hong Yeol ^a   Kim, Sung Hyun ^a   Holm, Ron T ^b   Hite, Jennifer ^b   Eddy Jr , Charles R ^b   Bang, Joona ^a   Kim, Jihyun ^a  

^a Korea University   (South Korea)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

GaN; Light emitting diodes; Plasma etching; Sapphire; Surface texturing

Indexed keywords

EID: 49349094168     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.05.046     Document Type: Letter

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