Antireflection microstructures fabricated upon fluorine-doped SiO2 films

Optics Letters

Volumn 26, Issue 21, 2001, Pages 1642-1644

  Kintaka, K ^a   Nishii, J ^a   Mizutani, A ^b   Kikuta, H ^b   Nakano, H ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Osaka City University   (Japan)

^c 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION MICROSTRUCTURES;

LIGHT REFLECTION; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING;

DIFFRACTIVE OPTICS;

EID: 0013301622     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.26.001642     Document Type: Article

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