A soft-imprint technique for submicron structure fabrication via in situ polymerization

Nanotechnology

Volumn 15, Issue 1, 2004, Pages 135-138

  Choi, Won Mook ^a   Park, O Ok ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELASTOMERS; HIGH PRESSURE EFFECTS; MICROELECTRONICS; MONOMERS; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY;

POLYDIMETHYSILOXANE; POLYMER PATTERNS; SOFT IMPRINT TECHNIQUE; SUBMICRON STRUCTURE FABRICATION;

POLYSILANES;

EID: 0742304054     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/1/026     Document Type: Article

References (11)

1. Xia Y and Whitesides G M 1998 Angew. Chem. Int. Edn Engl. 37 550
2. Kim E, Xia T, Zhao X H and Whitesides G M 1997 Adv. Mater. 9 651
3. Paul K E, Breen T L, Aizenberg J and Whitesides G M 1998 Appl. Phys. Lett. 73 2893
4. Marxolin C, Smith S P, Prentiss M and Whitesides G M 1998 Adv. Mater. 10 571
5. Wilbur J L, Kumar A, Biebuyck H A, Kim E and Whitesides G M 1996 Nanotechnology 7 452
6. Chou S Y, Krauss P R and Renstrom P J 1996 Science 272 85
7. Chou S Y, Krauss P R, Zhang W, Guo L and Zhang L 1997, J. Vac. Sci. Technol. B 15 2897
8. Chou S Y, Krauss P R and Renstrom P J 1996 J. Vac. Sci. Technol. B 14 4129
9. Krauss P R and Chou S Y 1997 Appl. Phys. Lett. 71 3174
10. Zankovych S, Hoffmann T, Seekamp J, Bruch J-U and Sotomayer C M 2001 Nanotechnology 12 91
11. Kang D Y and Lee H H 2000 Appl. Phys. Lett. 76 870