The fabrication of submicron patterns on curved substrates using a polydimethylsiloxane film mould

Nanotechnology

Volumn 15, Issue 12, 2004, Pages 1767-1770

  Choi, Won Mook ^a   Park, O Ok ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; FABRICATION; ORGANIC POLYMERS; SILICON; SUBSTRATES; SURFACE PROPERTIES;

DEFECT FORMATION; HOT-EMBOSSING; POLYDIMETHYLSILOXANE; SUBMICRON PATTERNS;

PLASTIC FILMS;

EID: 11144319407     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/12/013     Document Type: Article

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