Optical-softlithographic technology for patterning on curved surfaces

Journal of Micromechanics and Microengineering

Volumn 19, Issue 5, 2009, Pages

  Kim, J G ^a   Takama, N ^a   Kim, B J ^a   Fujita, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL CONTACTS; CONVENTIONAL PHOTOLITHOGRAPHY; CURVED SURFACES; FLEXIBLE POLYMERS; HIGH ASPECT RATIO; INDUSTRIAL PROCESSS; LITHOGRAPHIC TECHNOLOGIES; METAL FEATURES; MICRO PATTERNING; MICROFEATURES; MICROPATTERNS; NON-PLANAR SUBSTRATES; NON-PLANAR SURFACES; NOVEL CONCEPT; PATTERN TRANSFERS; PHOTOLITHOGRAPHIC PROCESS; POLYMER STRUCTURE; SOFT-LITHOGRAPHY;

ASPECT RATIO; FABRICATION; PHOTOLITHOGRAPHY; SUBSTRATES; THREE DIMENSIONAL;

SURFACES;

EID: 68249151158     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/5/055017     Document Type: Article

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