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Volumn 22, Issue 42, 2011, Pages
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Active doping of B in silicon nanostructures and development of a Si quantum dot solar cell
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Author keywords
[No Author keywords available]
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Indexed keywords
A-SI QD;
B ATOMS;
BIMODAL DISTRIBUTION;
BORON ATOM;
DEPTH-PROFILING ANALYSIS;
DOPING CONCENTRATION;
HALL EFFECT MEASUREMENT;
HIGH TEMPERATURE;
NANOMETER SILICON;
P-TYPE SI;
SI ATOMS;
SI LAYER;
SI QUANTUM DOT;
SILICON LAYER;
SILICON NANOSTRUCTURES;
SILICON QUANTUM DOTS;
ULTRA-THIN;
ATOMS;
BORON;
CONVERSION EFFICIENCY;
DEPTH PROFILING;
GRAIN BOUNDARIES;
HALL EFFECT;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR QUANTUM DOTS;
SILICON COMPOUNDS;
SILICON OXIDES;
SOLAR ENERGY;
SILICON;
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EID: 80053286498
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/22/42/425203 Document Type: Article |
Times cited : (45)
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References (25)
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