Effect of nitride passivation on the visible photoluminescence from Si-nanocrystals

Applied Physics Letters

Volumn 85, Issue 16, 2004, Pages 3408-3410

  Yang, Moon Seung ^a   Cho, Kwan Sik ^a   Jhe, Ji Hong ^a   Seo, Se Young ^a   Shin, Jung H ^a   Kim, Kyung Joong ^b   Moon, Dae Won ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; NITRIDES; PHOTOLUMINESCENCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NITRIDE PASSIVATION; SILICON-RICH SILICON NITRIDE (SRSO); VISIBLE PHOTOLUMINESCENCE; WHITE LUMINESCENCE;

NANOSTRUCTURED MATERIALS;

EID: 9744244927     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1787599     Document Type: Article

References (18)

1. L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. T. Shimizu-Iwayama, S. Nakao, and K. Saitoh, Appl. Phys. Lett. 65, 1814 (1994).
3. G. Franzò, A. Irrera, E. C. Moreira, M. Miritello, F. Iacona, D. Sanfilippo, G. Di Sefano, P. G. Fallica, and F. Priolo, Appl. Phys. A: Mater. Sci. Process. 74, 1 (2002).
4. L. Pavesi, L. Dal Negro, C. Mazzoleni, G. Franzò, and F. Priolo, Nature (London) 408, 440 (2000).
5. M. Zacharias, J. Heitmann, R. Scholz, U. Kahler, M. Schmidt, and J. Biasing, Appl. Phys. Lett. 80, 661 (2002).
6. F. Iacona, G. Franzò, and C. Spinella, J. Appl. Phys. 87, 1295 (2002).
7. K. S. Min, K. V. Shcheglov, C. M. Yang, H. A. Atwater, M. L. Brongersma, and A. Polman, Appl. Phys. Lett. 69, 2033 (1996).
8. S. Im, J. Y. Jeong, M. S. Oh, H. B. Kim, K. H. Chae, C. N. Whang, and J. H. Song, Appl. Phys. Lett. 74, 961 (1999).
9. L. Rebohle, J. von Borany, R. A. Yankov, W. Skorupa, I. E. Tyschenko, H. Fröb, and K. Leo, Appl. Phys. Lett. 71, 2809 (1997).
10. M. V. Wolkin, J. Jorne, P. M. Fauchet, G. Allan, and C. Delerue, Phys. Rev. Lett. 82, 197 (1999).
11. A. Puzder, A. J. Williamson, J. C. Grossman, and G. Galli, J. Chem. Phys. 117, 6721 (2002).
12. J. Dutta, I. M. Ream, P. Rota i Cabarrocas, and H. Hofmann, Nanostruct. Mater. 6, 843 (1995).
13. A. Daami, G. Bremond, I. Stalmans, and J. Poortmans, J. Lumin. 80, 167 (1999).
14. M. Molinari, H. Rinnert, M. Vergnat, and P. Weisbecker, Mater. Sci. Eng., B 101, 186 (2003).
15. N.-M. Park, C.-J. Choi, T.-Y. Seong, and S.-J. Park, Phys. Rev. Lett. 86, 1355 (2001).
16. Y. Q. Wang, Y. G. Wang, L. Cao, and Z. X. Cao, Appl. Phys. Lett. 83, 3474 (2003).
17. G. Compagnini, C. Galati, C. Miliani, and R. S. Cataliotti, Surf. Coat. Technol. 151-152, 268 (2002).
18. Y. H. Ha, S. Kim, S. Y. Lee, J. H. Kim, D. H. Baek, H. K. Kim, and D. W. Moon, Appl. Phys. Lett. 74, 3510 (1999).