The effect of oxidation temperature on the nano crystalline structure of ZrO2 films deposited on silicon and glass substrates

Crystal Research and Technology

Volumn 46, Issue 9, 2011, Pages 956-960

  Larijani, M M ^a   Najafi, D ^b   Eshghabadi, M ^b  

^a Nuclear Science and Technology Research Institute   (Iran)

^b ISLAMIC AZAD UNIVERSITY   (Iran)

Author keywords

magnetron sputtering; sheet resistivity; thermal oxidation; zirconium oxide

Indexed keywords

AFM; AVERAGE SURFACE ROUGHNESS; CRYSTALLINITIES; ELECTRICAL PROPERTY; EX SITU; FOUR-POINT PROBE MEASUREMENTS; GLASS SUBSTRATES; HIGHER TEMPERATURES; INTERFACIAL LAYER; NANO-CRYSTALLINE STRUCTURES; OXIDATION TEMPERATURE; PREFERENTIAL ORIENTATION; SHEET RESISTIVITY; SILICON SUBSTRATES; SUBSTRATE TEMPERATURE; THERMAL OXIDATION; XRD PATTERNS;

ELECTRIC PROPERTIES; FILM PREPARATION; GLASS; OXIDATION; PHASE INTERFACES; SILICON COMPOUNDS; SILICON OXIDES; SURFACE ROUGHNESS; ZIRCONIA; ZIRCONIUM; ZIRCONIUM ALLOYS;

SUBSTRATES;

EID: 80052097686     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.201100171     Document Type: Article

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