Effects of oxygen concentration in the Ar/O2 plasma on the bulk structure and surface properties of RF reactively sputtered zirconia thin films

Surface and Coatings Technology

Volumn 202, Issue 11, 2008, Pages 2332-2337

  Gottardi, G ^a   Laidani, N ^a   Micheli, V ^a   Bartali, R ^a   Anderle, M ^a  

^a ITC IRST   (Italy)

Author keywords

Reactive sputtering; Structural characterization; Surface properties; Zirconia

Indexed keywords

BINDING ENERGY; CHARACTERIZATION; COMPOSITION EFFECTS; OXYGEN; PHASE TRANSITIONS; REACTIVE SPUTTERING; STOICHIOMETRY; STRUCTURE (COMPOSITION); SURFACE PROPERTIES; THIN FILMS;

NANOGRAIN; STRUCTURAL CHARACTERIZATION;

ZIRCONIA;

BINDING ENERGY; CHARACTERIZATION; COMPOSITION EFFECTS; OXYGEN; PHASE TRANSITIONS; REACTIVE SPUTTERING; STOICHIOMETRY; STRUCTURE (COMPOSITION); SURFACE PROPERTIES; THIN FILMS; ZIRCONIA;

EID: 38949205625     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.08.052     Document Type: Article

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