A comparative study of the microstructure-dielectric properties of crystalline SrTiO 3 ALD films obtained via seed layer approach

Physica Status Solidi (A) Applications and Materials Science

Volumn 208, Issue 8, 2011, Pages 1920-1924

  Popovici, Mihaela ^a   Tomida, Kazuyuki ^a   Swerts, Johan ^a   Favia, Paola ^a   Delabie, Annelies ^a   Bender, Hugo ^a   Adelmann, Christoph ^a   Tielens, Hilde ^a   Brijs, Bert ^a   Kaczer, Ben ^a   Pawlak, Malgorzata A ^a   Kim, Min Soo ^a   Altimime, Laith ^a   Van Elshocht, Sven ^a   Kittl, Jorge A ^a  

^a IMEC   (Belgium)

Author keywords

atomic layer deposition; dielectric properties; high k dielectrics; metal insulator metal capacitors; microstructure; SrTiO 3

Indexed keywords

COMPARATIVE STUDIES; CRYSTALLINE STATE; HIGH-K DIELECTRIC; METAL-INSULATOR-METAL CAPACITORS; NANO-CRACKS; POST-DEPOSITION ANNEAL; SEED LAYER; SRTIO; TEMPLATE APPROACH; THERMALLY STABLE;

ATOMIC LAYER DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; DIELECTRIC MATERIALS; DIFFRACTIVE OPTICS; METAL INSULATOR BOUNDARIES; SINGLE CRYSTALS; STRONTIUM ALLOYS; STRONTIUM TITANATES; TITANIUM NITRIDE;

DIELECTRIC PROPERTIES;

EID: 80051692744     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201026710     Document Type: Article

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