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Volumn 97, Issue 16, 2010, Pages
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Impact of crystallization behavior of Srx Tiy O z films on electrical properties of metal-insulator-metal capacitors with TiN electrodes
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION RANGES;
CRYSTALLIZATION BEHAVIOR;
ELECTRICAL PROPERTY;
IN-BAND;
METAL-INSULATOR-METAL CAPACITORS;
OXIDE THICKNESS;
STOICHIOMETRIC FILMS;
TIN ELECTRODES;
ATOMIC LAYER DEPOSITION;
CAPACITORS;
CRYSTALLIZATION;
ELECTRIC PROPERTIES;
METAL INSULATOR BOUNDARIES;
OXIDE FILMS;
PEROVSKITE;
TITANIUM NITRIDE;
ELECTROLYTIC CAPACITORS;
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EID: 77958496563
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3505323 Document Type: Article |
Times cited : (29)
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References (7)
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