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Volumn 97, Issue 16, 2010, Pages

Impact of crystallization behavior of Srx Tiy O z films on electrical properties of metal-insulator-metal capacitors with TiN electrodes

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION RANGES; CRYSTALLIZATION BEHAVIOR; ELECTRICAL PROPERTY; IN-BAND; METAL-INSULATOR-METAL CAPACITORS; OXIDE THICKNESS; STOICHIOMETRIC FILMS; TIN ELECTRODES;

EID: 77958496563     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3505323     Document Type: Article
Times cited : (29)

References (7)
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    • 67349270310 scopus 로고    scopus 로고
    • 0167-9317,. 10.1016/j.mee.2009.03.045
    • J. A. Kittl, Microelectron. Eng. 0167-9317 86, 1789 (2009). 10.1016/j.mee.2009.03.045
    • (2009) Microelectron. Eng. , vol.86 , pp. 1789
    • Kittl, J.A.1
  • 5
  • 6
    • 1042298583 scopus 로고    scopus 로고
    • 0927-796X,. 10.1016/j.mser.2003.12.002
    • D. P. Norton, Mater. Sci. Eng. R. 0927-796X 43, 139 (2004). 10.1016/j.mser.2003.12.002
    • (2004) Mater. Sci. Eng. R. , vol.43 , pp. 139
    • Norton, D.P.1
  • 7
    • 0036567722 scopus 로고    scopus 로고
    • 0022-3093,. 10.1016/S0022-3093(02)00962-6
    • G. Lucovsky, J. Non-Cryst. Solids 0022-3093 303, 40 (2002). 10.1016/S0022-3093(02)00962-6
    • (2002) J. Non-Cryst. Solids , vol.303 , pp. 40
    • Lucovsky, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.