Voltage waveform to achieve a desired ion energy distribution on a substrate in contact with plasma

Plasma Sources Science and Technology

Volumn 20, Issue 4, 2011, Pages

  Diomede, Paola ^a   Nikolaou, Michael ^a   Economou, Demetre J ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCKING CAPACITOR; CIRCUIT MODELS; COLLISIONLESS; ENERGY SPREADS; GAUSSIANS; ION ENERGY DISTRIBUTIONS; MEAN ENERGY; MULTIPLE SOLUTIONS; PRE-SELECTED; RADIO FREQUENCIES; RF VOLTAGE; VOLTAGE WAVEFORMS; WAVE FORMS;

ELECTRIC POWER DISTRIBUTION; INVERSE PROBLEMS; ION BEAMS; PLASMA SOURCES;

IONS;

EID: 80051653698     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/4/045011     Document Type: Article

References (23)

1. Kawamura E, Vahedi V, Lieberman M A and Birdsall C K 1999 Plasma Sources Sci. Technol. 8 R45
2. Miller P and Riley M 1997 J. Appl. Phys. 82 3689
3. Panagopoulos T and Economou D J 1999 J. Appl. Phys. 85 3435
4. Metze A, Ernie D W and Oskam H J 1989 J. Appl. Phys. 65 993
5. Smith B A and Overzet L J 1997 Appl. Phys. Lett. 70 1950
6. Kohler K, Coburn J W, Horne D E, Kay E and Keller J H 1985 J. Appl. Phys. 57 59
7. Xu L, Economou D J, Donnelly V M and Ruchhoeft P 2005 Appl. Phys. Lett. 87 041502
8. Wang S-B and Wendt A E 2000 J. Appl. Phys. 88 643
9. Paterson M M, Chen H-Y and Wendt A E 2007 Plasma Sources Sci. Technol. 16 257
10. Buzzi F L, Ting Y-H and Wendt A E 2009 Plasma Sources Sci. Technol. 18 025009
11. Qin X V, Ting Y-H and Wendt A E 2010 Plasma Sources Sci. Technol. 19 065014
12. Kudlacek P, Rumphorst R F and van de Sanden M C M 2009 J. Appl. Phys. 106 073303
13. Agarwal A and Kushner M J 2005 J. Vac. Sci. Technol. A 23 1440
14. Rauf S 2000 J. Appl. Phys. 87 7647
15. Barnat E V and Lu T-M 2002 J. Appl. Phys. 92 2984
16. Edelberg E A and Aydil E S 1999 J. Appl. Phys. 86 4799
17. Sobolewski M A, Olthoff J K and Wang Y 1999 J. Appl. Phys. 85 3966
18. Bose D, Govindan T R and Meyyappan M 2000 J. Appl. Phys. 87 7176
19. Rakhimova T V et al 2007 IEEE Trans. Plasma Sci. 35 1229
20. Georgieva V, Bogaerts A and Gijbels R 2004 Phys. Rev. E 69 026406
21. Barnes M S, Foster J C and Keller J H 1991 IEEE Trans. Plasma Sci. 19 240
22. Metze A, Ernie D W and Oskam H J 1986 J. Appl. Phys. 60 3081
23. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley-Interscience)