Plasma polymerized methylsilane. I: Characterization of thin photosensitive films for advanced lithography applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2534-2542

  Monget, C ^a   Joubert, O ^b   Inglebert, R L ^b  

^a ORANGE LABS   (France)

^b CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; DEPOSITION; ELLIPSOMETRY; HYDROGEN; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; PLASMA POLYMERIZATION; PLASTIC FILMS; POLYSILANES; PRESSURE EFFECTS; SILICON CARBIDE; THERMAL EFFECTS;

PLASMA POLYMERIZED METHYLSILANES; THIN PHOTOSENSITIVE FILMS;

OPTICAL FILMS;

EID: 0034264789     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1288943     Document Type: Article

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