Study of critical dimensions of printable phase defects using an extreme ultraviolet microscope

Japanese Journal of Applied Physics

Volumn 48, Issue 6 PART 2, 2009, Pages

  Kamaji, Yoshito ^a,c   Takase, Kei ^a,c   Yoshizumi, Takahiro ^a,c   Sugiyama, Takashi ^b   Uno, Toshiyuki ^b   Watanabe, Takeo ^a,c   Kinoshita, Hiroo ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; PHOTOMASKS;

ACTINIC MASK INSPECTION; COATED SUBSTRATES; CRITICAL DIMENSION; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; EXTREME ULTRAVIOLET MICROSCOPIES; MICROSCOPY SYSTEMS; PHASE DEFECTS; SCHWARZSCHILD OPTICS; X-RAY ZOOMING TUBE;

DEFECTS;

EID: 70249115141     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/jjap.48.06fa07     Document Type: Article

References (4)

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