Enhanced bias illumination stability of oxide thin film transistor through insertion of ultrathin positive charge barrier into active material

Applied Physics Letters

Volumn 99, Issue 2, 2011, Pages

  Oh, Himchan ^a   Ko Park, Sang Hee ^a   Hwang, Chi Sun ^a   Yang, Shinhyuk ^a   Ki Ryu, Min ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE MATERIAL; GATE INSULATOR; LOW PROCESS TEMPERATURE; NEGATIVE GATE; NOVEL STRATEGIES; POSITIVE CHARGES; STABILITY ENHANCEMENT; STABLE OXIDES; STRESS STABILITY; ULTRA-THIN;

OXYGEN VACANCIES; THIN FILM DEVICES; TRANSISTORS;

THIN FILM TRANSISTORS;

EID: 79960482790     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3610476     Document Type: Article

References (21)

1. H. D. Kim, J.-S. Park, Y.-G. Mo, and S. S. Kim, International Meeting on Information Display, 35 (2009).
2. M. Ito, M. Kon, T. Okubo, M. Ishizaki, and N. Sekine, Proceedings of the International Display Workshop 2006, p. 663.
3. S.-H. Ko Park, D.-H. Cho, C.-S. Hwang, S. Yang, M. K. Ryu, C.-W. Byun, S. M. Yoon, W.-S. Cheong, K. I. Cho, and J.-H. Jeon, Electron. Telecommun. Res. Inst. J. 31, 653 (2009). 10.4218/etrij.09.1209.0043
4. J. K. Jeong, H. W. Yang, J. H. Jeong, Y.-G. Mo, and H. D. Kim, Appl. Phys. Lett. 93, 123508 (2008). 10.1063/1.2990657
5. M. K. Ryu, S. Yang, S.-H. Ko Park, C.-S. Hwang, and J. K. Jeong, Appl. Phys. Lett. 5, 173508 (2009). 10.1063/1.3257726
6. J.-H. Shin, J.-S. Lee, C.-S. Hwang, S.-H. Ko Park, W.-S. Cheong, M. Ryu, C.-W. Byun, J.-I. Lee, and H. Y. Chu, Electron. Telecommun. Res. Inst. J. 31, 62 (2009). 10.4218/etrij.09.0208.0266
7. K.-H. Lee, J. S. Jung, K. S. Son, J. S. Park, T. S. Kim, R. Choi, J. K. Jeong, J.-Y. Kwon, B. Koo, and S. Lee, Appl. Phys. Lett. 95, 232106 (2009). 10.1063/1.3272015
8. K. H. Ji, J.-I. Kim, Y.-G. Mo, J. H. Jeong, S. Yang, C.-S. Hwang, S.-H. Ko Park, M.-K. Ryu, S.-Y. Lee, and J. K. Jeong, IEEE Electron Device Lett. 31, 1404 (2010). 10.1109/LED.2010.2073439
9. T. Kamiya, K. Nomura, M. Hirano, and H. Hosono, Phys. Status Solidi A 206, 860 (2009). 10.1002/pssa.200881303
10. A. Janotti and C. G. Van de Walle, Appl. Phys. Lett. 87, 122102 (2005). 10.1063/1.2053360 (Pubitemid 41717369)
11. H. Seo, C.-J. Park, Y.-J. Cho, Y.-B. Kim, and D.-K. Choi, Appl. Phys. Lett. 96, 232101 (2010). 10.1063/1.3424790
12. K. Nomura, T. Kamiya, H. Yanagi, E. Ikenaga, K. Yang, K. Kobayashi, M. Hirano, and H. Hosono, Appl. Phys. Lett. 92, 202117 (2008). 10.1063/1.2927306 (Pubitemid 351733899)
13. H. Oh, S.-M. Yoon, M. K. Ryu, C.-S. Hwang, S. Yang, and S.-H. Ko Park, Appl. Phys. Lett. 97, 183502 (2010). 10.1063/1.3510471
14. H. Oh, S.-M. Yoon, M. K. Ryu, C.-S. Hwang, S. Yang, and S.-H. Ko Park, Appl. Phys. Lett. 98, 033504 (2011). 10.1063/1.3540500
15. K. H. Ji, J.-I. Kim, H. Y. Jung, S. Y. Park, R. Choi, U. K. Kim, C. S. Hwang, D. Lee, H. Hwang, and J. K. Jeong, Appl. Phys. Lett. 98, 103509 (2011). 10.1063/1.3564882
16. B. S. Yang, M. S. Huh, S. Oh, U. S. Lee, Y. J. Kim, M. S. Oh, J. K. Jeong, C. S. Hwang, and H. J. Kim, Appl. Phys. Lett. 98, 122110 (2011). 10.1063/1.3571448
17. B. Ryu, H.-K. Noh, E.-A. Choi, and K. J. Chang, Appl. Phys. Lett. 97, 022108 (2010). 10.1063/1.3464964
18. J. C. Park, S. Kim, S. Kim, C. Kim, I. Song, Y. park, U.-I. Jung, D. H. Kim, and J.-S. Lee, Adv. Mater. 22, 5512 (2010). 10.1002/adma.201002397
19. J. H. Kim, U. K. Kim, Y. J. Chung, and C. S. Hwang, Phys. Status Solidi Rapid Res. Lett. 5, 178 (2011). 10.1002/pssr.201105090
20. D. G. Rethwisch and J. A. Dumesic, Langmuir 2, 73 (1986). 10.1021/la00067a013
21. L. Wang, T. Maxisch, and G. Ceder, Phys. Rev. B. 73, 195107 (2006). 10.1103/PhysRevB.73.195107 (Pubitemid 43673534)