Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1052-1056

  Gorelick, Sergey ^a   Vila Comamala, Joan ^a   Guzenko, Vitaliy ^a   Mokso, Rajmund ^a   Stampanoni, Marco ^a   David, Christian ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

Au electroplating; Electron beam lithography; Hard X rays; High aspect ratio; PMMA; X ray optics

Indexed keywords

AU ELECTROPLATING; AU NANOSTRUCTURE; BEAM SHAPERS; BEAM-SHAPING; FABRICATION METHOD; FRESNEL ZONE PLATE; HARD X RAY; HIGH ASPECT RATIO; HIGH ASPECT RATIO NANO-STRUCTURES; HIGH ASPECT RATIO STRUCTURES; METALLIC NANOSTRUCTURE; PHOTON ENERGY; POLYMER MOLDS; THICK LAYERS;

DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; LIGHT; NANOSTRUCTURES; PHOTORESISTS; PRESSURE DROP; X RAY OPTICS; X RAYS;

ASPECT RATIO;

EID: 76949084128     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.091     Document Type: Article

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