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Volumn 27, Issue 2, 2009, Pages

High-aspect-ratio germanium zone plates fabricated by reactive ion etching in chlorine

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC EXPOSURES; DEGREE OF ANISOTROPIES; ELECTROPLATING PROCESS; FABRICATION PROCESS; FIRST ORDERS; HALF-PITCH GRATINGS; HIGH ASPECT RATIOS; REACTIVE IONS; REACTIVE-ION ETCHINGS; REPRODUCIBILITY; SIDEWALL PASSIVATIONS; SOFT X-RAYS; THEORETICAL VALUES; ZONE PLATES;

EID: 64549134292     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3089371     Document Type: Article
Times cited : (18)

References (25)
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    • edited by S. Aoki, Y. Kagoshima, and Y. Suzuki (The Institute of Pure and Applied Physics, Tokyo, Japan), Vol.
    • X-Ray Microscopy, edited by, S. Aoki, Y. Kagoshima, and, Y. Suzuki, (The Institute of Pure and Applied Physics, Tokyo, Japan, 2006), Vol. 7.
    • (2006) X-Ray Microscopy , vol.7
  • 4
    • 0035831810 scopus 로고    scopus 로고
    • 0003-6951 10.1063/1.1361285.
    • M. Peuker, Appl. Phys. Lett. 0003-6951 10.1063/1.1361285 78, 2208 (2001).
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    • Peuker, M.1
  • 20
    • 0016037493 scopus 로고
    • 0030-3941 10.1364/JOSA.64.000301.
    • J. Kirz, J. Opt. Soc. Am. 0030-3941 10.1364/JOSA.64.000301 64, 301 (1974).
    • (1974) J. Opt. Soc. Am. , vol.64 , pp. 301
    • Kirz, J.1
  • 22
    • 34347266270 scopus 로고
    • 0033-4545 10.1351/pac199264050703.
    • F. Fracassi and R. Dagostino, Pure Appl. Chem. 0033-4545 10.1351/pac199264050703 64, 703 (1992).
    • (1992) Pure Appl. Chem. , vol.64 , pp. 703
    • Fracassi, F.1    Dagostino, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.