Fabrication of Fresnel zone plates for hard X-rays

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1467-1470

  Jefimovs, K ^a   Bunk, O ^a   Pfeiffer, F ^a   Grolimund, D ^a   van der Veen, J F ^a   David, C ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

Electron beam lithography; Electroplating; Focusing; Fresnel zone plate; Hard X rays; X ray microscopy

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; FOCUSING; MOLECULAR STRUCTURE; X RAY MICROSCOPES; X RAYS;

FRESNEL ZONE PLATES; HARD X-RAYS; X-RAY ENERGY;

GOLD COMPOUNDS;

EID: 34247627946     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.112     Document Type: Article

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