Application of X-ray mask fabrication technologies to high resolution, large diameter Ta Fresnel zone plates

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 525-529

  Ozawa, A ^a   Tamamura, T ^b   Ishii, T ^b   Yoshihara, H ^a   Kagoshima, T ^c  

^a NTT Advanced Technology Corporation   (Japan)

^b NTT CORPORATION   (Japan)

^c HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; DRY ETCHING; FABRICATION; MASKS; OPTIMIZATION; SILICON NITRIDE; TANTALUM;

ELECTRON BEAM DATA CONVERSION ALGORITHM; FRESNEL ZONE PLATES; X RAY MASK FABRICATION PROCESS;

X RAY LITHOGRAPHY;

EID: 0031069256     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00202-X     Document Type: Article

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