Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Liebig, B ^a   Braithwaite, N St J ^b   Kelly, P J ^c   Chistyakov, R ^d   Abraham, B ^d   Bradley, J W ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b OPEN UNIVERSITY   (United Kingdom)

^c MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^d Zpulser LLC   (United States)

Author keywords

HIPIMS; Langmuir probe; Modulated Pulsed Power Magnetron Sputtering; Plasma diagnostic

Indexed keywords

CHROMIUM; ELECTRIC DISCHARGES; LANGMUIR PROBES; MAGNETRON SPUTTERING; MAGNETRONS; PLASMA DIAGNOSTICS;

ELECTRON AND ION DENSITIES; HIPIMS; LANGMUIR PROBE MEASUREMENTS; MODULATED PULSED POWER MAGNETRON SPUTTERING (MPP); MODULATED PULSED POWER MAGNETRON SPUTTERING (MPPMS); MODULATION FREQUENCIES; REPETITION FREQUENCY; TEMPORAL DEVELOPMENT;

ELECTRON TEMPERATURE;

EID: 79959777517     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.01.017     Document Type: Article

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