Resist pattern inspection using fluorescent dye-doped polystyrene thin films in reactive-monolayer-assisted thermal nanoimprint lithography

Japanese Journal of Applied Physics

Volumn 50, Issue 6 PART 2, 2011, Pages

  Kubo, Shoichi ^a,b   Sato, Yuko ^a   Hirai, Yoshihiko ^b,c   Nakagawa, Masaru ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATING METHODS; DEFECT INSPECTION; DIIMIDE; DYE-DOPED; FLUORESCENCE INTENSITIES; FLUORESCENT DYES; HIGH MOLECULAR WEIGHT; LOW MOLECULAR WEIGHT; MICROSCOPIC DEFECTS; NANO-IMPRINTING; POLYSTYRENE THIN FILMS; RESIDUAL LAYERS; RESIST FILMS; RESIST LAYERS; RESIST PATTERN; RHEOLOGICAL STUDIES; THERMAL NANOIMPRINT LITHOGRAPHY; ULTRA-VIOLET LIGHT;

DEFECTS; FLUORESCENCE; FLUORESCENCE MICROSCOPY; GRAFTING (CHEMICAL); INSPECTION; MONOLAYERS; PHOTOREACTIVITY; PHOTORESISTS; PLASTICIZERS; POLYSTYRENES; THIN FILMS; ULTRAVIOLET RADIATION;

NANOIMPRINT LITHOGRAPHY;

EID: 79959472568     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.06GK10     Document Type: Article

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