Fluorescence microscopy for quality control in nanoimprint lithography

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 623-628

  Finder, Ch ^a   Beck, M ^b   Seekamp, J ^c   Pfeiffer, K ^d   Carlberg, P ^b   Maximov, I ^b   Reuther, F ^d   Sarwe, E L ^b   Zankovich, S ^c   Ahopelto, J ^e   Montelius, L ^b   Mayer, C ^a   Sotomayor Torres, C M ^c  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b LUND UNIVERSITY   (Sweden)

^c UNIVERSITY OF WUPPERTAL   (Germany)

^d MICRO RESIST TECHNOLOGY GMBH   (Germany)

^e VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

Fluorescence microscopy; Nanoimprint lithography; Polymer; Quality control; Stamp

Indexed keywords

ADHESION; FLUORESCENCE; LITHOGRAPHY; MICROSCOPIC EXAMINATION; POLYMERS; QUALITY CONTROL;

NANOIMPRINT LITHOGRAPHY (NIL);

NANOTECHNOLOGY;

EID: 0038020122     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00123-0     Document Type: Conference Paper

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