Optical monitoring of a poly(styrene) residual layer on a photocrosslinkable monolayer in thermal nanoimprint lithography

Journal of Photopolymer Science and Technology

Volumn 22, Issue 2, 2009, Pages 201-204

  Nagase, Koichi ^a   Ohtake, Tomoyuki ^b   Takaoka, Toshiaki ^b   Kubo, Shoichi ^a   Nakagawa, Masaru ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b NOF Corporation   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Polystyrene; Reactive monolayer; Residual layer thickness; Thermal nanoimprint

Indexed keywords

EID: 70350179547     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.201     Document Type: Article

References (6)

1. S. Y. Chou, P. R. Krauss and P. J. Penstrom, Appl. Phys. Lett., 67 (1995)3114.
2. S. Y. Chou, P. R Krauss and P. J. Renstrom, Science, 111 (1996) 85.
3. M. Nakagawa, H. Oda, T. Ohtake, and T. Takaoka, JP'patent, Appl. no. 2007-222128.
4. H. Oda, T. Ohtake, T. Takaoka and M. Nakagawa, submitted.
5. F. Lazzarino, C. Gourgon, P. Schiavone and C. Perret, J. Vac. Sci. Technol. B, 22 (2004) 3318.
6. H. C. Scheer, N. Bogdanski, M. Wissen, S. Mollenbeck, Microelectr. Eng., 85 (2008) 890 204.