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Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

Fluorescent UV-curable resists for UV nanoimprint lithography

(4) Kobayashi, Kei a,b Sakai, Nobuji c Matsui, Shinji b,d Nakagawa, Masaru a,b

a TOHOKU UNIVERSITY (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

c TOYO GOSEI CO LTD (Japan)

d UNIVERSITY OF HYOGO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BENZOIC ACID; ETHYL ESTERS; EXPOSURE DOSE; FLUORESCENCE INTENSITIES; FLUORESCENT DYES; LINEAR CORRELATION; PATTERN DEFECTS; PHOTO-INITIATOR; RADICAL PHOTOPOLYMERIZATION; RESIDUAL LAYER THICKNESS; RHODAMINE 6G; TETRAFLUOROBORATES; UV CURABLE; UV NANOIMPRINT LITHOGRAPHY; UV-CURING; UV-LIGHT; UV-NANOIMPRINT;

CURING; ESTERS; FILM THICKNESS; FLUORESCENCE; FLUORESCENCE MICROSCOPY; PHOTOBLEACHING; PHOTOPOLYMERIZATION; RESINS; THIN FILMS; VAPOR DEPOSITION;

NANOIMPRINT LITHOGRAPHY;

EID: 77955337310 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.06GL07 Document Type: Article

Times cited : (12)

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