Reactive-monolayer-assisted thermal nanoimprint lithography with a benzophenone-containing trimethoxysilane derivative for patterning thin chromium and copper films

Journal of Photopolymer Science and Technology

Volumn 23, Issue 1, 2010, Pages 83-86

  Kubo, Shoichi ^a   Ohtake, Tomoyuki ^b   Kang, Eui Chul ^b   Nakagawa, Masaru ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b NOF Corporation   (Japan)

Author keywords

Benzophenone containing trimethoxysilane; Patterned metal film; Reactive monolayer assisted thermal nanoimprint lithography; Wet etching

Indexed keywords

EID: 77957128988     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.23.83     Document Type: Article

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