Effects of electrons on the shape of nanopores prepared by focused electron beam induced etching

Nanotechnology

Volumn 22, Issue 28, 2011, Pages

  Liebes, Yael ^a   Hadad, Binyamin ^a   Ashkenasy, Nurit ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION VOLTAGES; BEAM ACCELERATION; CHEMICAL COMPOSITIONS; CHEMICAL ETCH; CHEMICAL ETCHING; CONTROLLED SIZE; ELECTRON ACCELERATION; ELECTRON BEAM SOURCE; FOCUSED ELECTRON BEAMS; LONG RANGE EFFECTS; MEMBRANE COMPOSITION; NANOMETRICS; NANOPORE SIZE; PRIMARY ELECTRON BEAMS; RATE-LIMITING STEPS; SCANNING PROBE MICROSCOPE; SILICON NITRIDE MEMBRANE; SINGLE-MOLECULE DETECTION;

ELECTRON BEAMS; ELECTRON OPTICS; ETCHING; NANOPORES; RADIATION CHEMISTRY; SILICON NITRIDE;

ELECTRONS;

EID: 79959193716     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/28/285303     Document Type: Article

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