Electron beam induced SiO2 etch selectivity and its application to oxide nano-aperture formation

Microelectronic Engineering

Volumn 83, Issue 11-12, 2006, Pages 2493-2498

  Kim, D W ^a   Kim, Y C ^a   Bui, V C ^a   Song, M S ^a   Han, C H ^a   Choi, S S ^a  

^a SunMoon University   (South Korea)

Author keywords

Electron beam; Etch selectivity; Nano aperture array; Nano fabrication; Oxide etching

Indexed keywords

ELECTRON BEAMS; ELECTRON IRRADIATION; ETCHING; OXIDATION;

ETCH SELECTIVITY; NANO-APERTURE ARRAY; NANO-FABRICATION; OXIDE ETCHING;

SILICON COMPOUNDS;

EID: 33751358978     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.05.004     Document Type: Article

References (16)

1. Okamoto K., and Kawata S. Phys. Rev. Lett. 83 (1999) 4534
2. Ashkin A. Phys. Rev. Lett. 24 (1970) 157
3. Davis R.C., Williams C.C., and Neuzil P. Appl. Phys. Lett. 66 (1995) 2309
4. Ruiter A.G.T., Moers M.H.P., van Hulst N.F., and de Boer M. J. Vac. Sci. Technol. B 14 (1996) 597
5. Mihalcea C., Scholz W., Werner S., Munster S., Oesterschulze E., and Kassing R. Appl. Phys. Lett. 68 (1996) 3531
6. D.D. Carlo, W. Chang, L.P. Lee, First Annual International IEEE-EMRBS Special Topic Conference on Microtechnologies in Medicine and Biology, October 12-14, 2000, Lyon, France.
7. Partovi A., Peale D., Wuttig M., Murray C.A., Zydzik G., Hopkins L., Baldwin K., Hopson W.S., Wynn J., Lopata J., Dhar L., Chichester R., and Yeh J.H. Appl. Phys. Lett. 75 (1999) 1515
8. Martin Y., Rishton S., and Wickramasinghe H.K. Appl. Phys. Lett. 71 (1997) 1
9. Mamin H.J., Terris B.D., Fan L.S., Hoen S., Barret R.C., and Rugar D. IBM J. Res. Dev. 39 (1995) 681
10. Mitsuhashi Y. Jpn. J. Appl. Phys. 37 Part 1 (1998) 2079
11. Choi S.S., Ok J.T., Kim D.W., Jung M.Y., and Park M.J. J. Kor. Phys. Soc. 45 (2004) 1659
12. Choi S.S., Kim D.W., and Park M.J. J. Kor. Phys. Soc. 45 (2004) 1500
13. Allen P.E., Griffis D.P., Radzimski Z.J., and Russell P.E. J. Vac. Sci. Technol. B 10 (1992) 965
14. Hoole A.C.F., and Broers A.N. J. Vac. Sci. Technol. B 10 (1992) 2855
15. Barnes J.R., Hoole A.C.F., Murrell M.P., Welland M.E., Broers A.N., Bourgoin J.P., Biebuyck H., Johnson M.B., and Michel B. Appl. Phys. Lett. 67 (1995) 1538
16. Pan X., Broers A.N., and Jeynes C. J. Vac. Sci. Technol. B 10 (1992) 2882