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Volumn 20, Issue 24, 2009, Pages

The controlled fabrication of nanopores by focused electron-beam-induced etching

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; ELECTRON-BEAM EXPOSURE; ELEMENTAL SILICON; FOCUSED ELECTRON BEAMS; LINEAR DEPENDENCE; MASS TRANSPORT; NANOMETRIC HOLES; NANOPORE SIZE; OPTIMAL PRESSURE; PORE DIAMETERS; PORE FORMATION; PROCESS CYCLES; PROCESS PARAMETERS; SILICON NITRIDE MEMBRANE; SILICON-BASED; SIZE AND SHAPE;

EID: 67649184581     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/24/245302     Document Type: Article
Times cited : (44)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.