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Volumn 519, Issue 19, 2011, Pages 6258-6263
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The influence of methanol addition during the film growth of SnO 2 by atmospheric pressure chemical vapor deposition
a
TNO
(Netherlands)
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Author keywords
APCVD; TCO; Tin oxide
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Indexed keywords
APCVD;
ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION;
CHEMICAL VAPOR DEPOSITION REACTORS;
DEPOSITION PROCESS;
FILM TRANSPARENCY;
HIGH MOBILITY;
MAIN EFFECT;
POINT FLOWS;
TCO;
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
COALESCENCE;
CONDUCTIVE FILMS;
ELECTRIC PROPERTIES;
METHANOL;
OXIDE FILMS;
PRESSURE EFFECTS;
TIN;
TIN OXIDES;
VANADIUM;
FILM GROWTH;
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EID: 79958192748
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.03.125 Document Type: Article |
Times cited : (31)
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References (41)
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