Growth rate control in ALD by surface functionalization: Alkyl alcohols on metal oxides

ECS Transactions

Volumn 33, Issue 2, 2010, Pages 333-342

  Yanguas Gil, Angel ^a   Elam, Jeffrey W ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; CHLORINE COMPOUNDS; II-VI SEMICONDUCTORS; METALS; OXIDE MINERALS; OXYGEN; PRASEODYMIUM COMPOUNDS; SURFACE CHEMISTRY; TITANIUM DIOXIDE; ZINC OXIDE;

ALKYL ALCOHOLS; DOPED MATERIALS; LOW CONCENTRATIONS; LOW RESISTIVITY; METAL PRECURSOR; ORGANIC MOLECULES; OXYGEN SOURCES; SURFACE FUNCTIONALIZATION;

GROWTH RATE;

EID: 79952555973     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3485269     Document Type: Conference Paper

References (10)

1. R. L. Puurunen, Journal of Applied Physics 97 (12), 121301 (2005).
2. N. Kumar, A. Yanguas-Gil, S. R. Daly, G. S. Girolami and J. R. Abelson, J. Am. Chem. Soc. 130 (52), 17660 (2008).
3. A. Kytokivi, J. P. Jacobs, A. Hakuli, J. Merilainen and H. H. Brongersma, Journal of Catalysis 162 (2), 190-197 (1996).
4. R. J. Silvennoinen, O. J. T. Jylha, M. Lindblad, J. P. Sainio, R. L. Puurunen and A. O. I. Krause, Applied Surface Science 253 (9), 4103-4111 (2007).
5. H. E. Evans and W. H. Weinberg, Journal of Chemical Physics 71 (4), 1537-1542 (1979).
6. H. Idriss and E. G. Seebauer, J. Mol. Catal. A-Chem. 152 (1-2), 201-212 (2000).
7. K. S. Kim, M. A. Barteau and W. E. Farneth, Langmuir 4 (3), 533-543 (1988).
8. Y. Suda, T. Morimoto and M. Nagao, Langmuir 3 (1), 99-104 (1987).
9. M. Ritala, M. Leskela, L. Niinisto and P. Haussalo, Chem. Mat. 5 (8), 1174-1181 (1993).
10. J. W. Elam and S. M. George, Chem. Mat. 15 (4), 1020-1028 (2003).